Exposure device
US7701552B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 27, 2008 |
| Grant date | Apr 20, 2010 |
| Priority date | — |
| Expiry date | Oct 4, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70291
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention presents an exposure device, which includes an optical source for emitting a UV ray, a first lighting system for shaping the UV ray into a collimated light beam, an aperture member for producing rectangular first and second light beams based on the light beam from first lighting system by using the first and second rectangular windows, first and second spatial light modulators for spatially modulating the first and second light beams, respectively, and first and second projection lighting systems for guiding the modulated first and second light beams to the object.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.