Patent · US Expired

Expanded thermal plasma apparatus

US7703413B2 · kind B2 · utility

7Cited by

6References

26Claims

0Family size

Assignee

Sabic Innovative Plastics B.V. · NL

Inventors

Thomas Miebach · Ballston Spa, US
Charles D. Iacovangelo · Niskayuna, US
William A. Morrison · Albany, US

Key dates

Filing date	Jun 28, 2004
Grant date	Apr 27, 2010
Priority date	—
Expiry date	Sep 9, 2025

Classification

Technology area (CPC H)Electricity
CPC primaryH05H1/3463
WIPO fieldChemical engineering
WIPO sectorChemistry

Abstract

Disclosed herein is an assembly for plasma generation comprising a cathode plate comprising a fixed cathode tip, the cathode tip being integral part of the cathode plate. The assembly further comprises at least one cascade plate, at least one separator plate disposed between the cathode plate and the cascade plate, an anode plate, and an inlet for a gas. The cathode plate, separator plate, cascade plate and anode plate are “electrically isolated” from one another, and the electrically isolated cathode plate, separator plate, and cascade plate define a plasma generation chamber. The cathode tip is disposed within the plasma generation chamber.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.