Manufacture of electroless cobalt deposition compositions for microelectronics applications
US7704306B2 · kind B2 · utility
1Cited by
3References
22Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 16, 2006 |
| Grant date | Apr 27, 2010 |
| Priority date | — |
| Expiry date | Aug 24, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/76849
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of preparing an aqueous electroless deposition composition for electrolessly depositing Co or a Co alloy onto a substrate in manufacture of microelectronic devices by treating water or an aqueous electroless deposition composition with a deoxygenating treatment to reduce the oxygen concentration.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.