Crystal forming apparatus and method for using same
US7704325B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jan 2, 2008 |
| Grant date | Apr 27, 2010 |
| Priority date | — |
| Expiry date | Jan 9, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T117/1024
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A crystal forming apparatus and method for using the apparatus, the method including depositing a precipitant solution in a site, incubating the site, during which time volatile vapor evaporates from the precipitant solution and accumulates in the site, and pumping the accumulated volatile vapor away from the site. An exemplary apparatus includes a sealed site except for a vent on the sealed site. In one embodiment, the vent is a passive vent that inhibits vapor diffusion out of the site. In another embodiment, the vent is an active vent that opens in response to a pressure differential. The present invention accelerates and controls the crystal growth process by pumping volatile vapor away from the sealed site.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.