Patent · US Active

Pattern replication with intermediate stamp

US7704425B2 · kind B2 · utility

19Cited by

4References

32Claims

0Family size

Assignee

OBDUCAT AB · SE

Inventors

Babak Heidari · Furulund, SE
Anette Löfstrand · Lund, SE
Erik Bolmsjö · Malmö, SE
Erik Theander · Lund, SE
Marc Beck · Malmö, SE

Key dates

Filing date	Nov 8, 2005
Grant date	Apr 27, 2010
Priority date	—
Expiry date	Sep 20, 2028

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB29C2059/023
WIPO fieldOther special machines
WIPO sectorMechanical engineering

Abstract

The invention relates to a two-step process for transferring a pattern from a template (1) to a target surface of a substrate, by creating an intermediate flexible polymer stamp (5) from the template in a primary step, and then using the polymer stamp to make an imprint in a radiation-sensitive moldable layer on the target surface in a secondary step. In the secondary step, the process steps of pressing the polymer stamp and the substrate against each other, UV exposure of the moldable layer through the polymer stamp, and postbaking of the radiated moldable layer, are all performed at a control constant temperature, in order to eliminate damages to the pattern created in the moldable layer caused by thermal expansion effects.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.