Patent · US Active

Imprint lithographic method for making a polymeric structure

US7704432B2 · kind B2 · utility

57Cited by
6References
33Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 18, 2006
Grant dateApr 27, 2010
Priority date—
Expiry dateFeb 25, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T428/254
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

An imprint lithographic method for making a polymeric structure comprising the steps of:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.