Process for producing patterned optical filter layers on substrates

US7704683B2 · kind B2 · utility

Assignee

• Schott AG · DE

Inventors

• Dieter Wittenberg · Dortmund, DE
• Thomas Kuepper · Bad Gandersheim, DE
• Lutz Zogg · Bad Gandersheim, DE
• Andree Mehrtens · Eschershausen, DE

Key dates

• Filing date: Jul 15, 2005
• Grant date: Apr 27, 2010
• Expiry date: Jun 5, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B5/201
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

The invention provides a process for producing at least one optical filter layer segment on a substrate. The process includes The deposition of the optical filter layer, at least at times, takes place at a temperature of over 150° C., preferably in a range from over 150° C. up to and including 400° C.