Patent · US Active

Online wavefront measurement and display

US7708411B2 · kind B2 · utility

1Cited by

2References

20Claims

0Family size

Assignee

BAUSCH & LOMB INCORPORATED · US

Inventors

Hans-Joachim Polland · Wolfratshausen, DE
Gerhard Youssefi · Landshut, DE
Stefan Seitz · Windach, DE

Key dates

Filing date	Jul 22, 2004
Grant date	May 4, 2010
Priority date	—
Expiry date	Feb 7, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG06T2207/30041
WIPO fieldComputer technology
WIPO sectorElectrical engineering

Abstract

A fast algorithm is presented which allows for substantially simultaneous acquisition, analysis, and display of a wavefront centroid image, referred to as online aberrometry. A method embodiment involves determination of an average, or most frequently occurring, wavefront aberration over a selected time interval, e.g., 20 sec. Online pupil diameter measurement allows analysis of wavefront aberration as a function of changing pupil size. A wavefront measuring apparatus is disclosed that supports online aberrometry.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.