Method of manufacturing of polymer-coated particles for chemical mechanical polishing

US7709053B2 · kind B2 · utility

Assignee

• Rohm and Haas Electronic Materials CMP Holdings, Inc. · US

Inventors

• Hongyu Wang · Northville, US
• John Francis Quanci · Haddonfield, US
• Richard E. Partch · Hannawa Falls, US
• Nathaniel A. Barney · Wilmington, US

Key dates

• Filing date: Jul 29, 2004
• Grant date: May 4, 2010
• Expiry date: Oct 10, 2027

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C01P2002/80
• WIPO field: Basic materials chemistry
• WIPO sector: Chemistry

Abstract

A method of manufacturing polymer-coated particles is useful for chemical mechanical polishing magnetic, optical, semiconductor or silicon substrates. First it provides a dispersion of particle cores in a non-aqueous solvent. Then introducing a polymeric precursor into the dispersion to react the polymeric precursor forms a polymer. The polymer coats at least a portion of the surface of the particle cores with the polymer and forms the polymer-coated particles having a solid outer polymeric shell. Substituting the non-aqueous solvent with water forms an aqueous mixture containing the polymer-coated particles. And it forms an aqueous chemical mechanical polishing formulation with the polymer-coated particles without drying the polymer-coated particles.