Polarized broadband wafer inspection
US7710564B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2008 |
| Grant date | May 4, 2010 |
| Priority date | — |
| Expiry date | Dec 18, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/21
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
In one embodiment, a surface inspection system comprises a radiation directing assembly to target radiation onto a surface of an object, the radiation directing assembly comprising a radiation source that emits a broadband radiation beam, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and a beam splitter, a radiation collection assembly to collect radiation reflected from the surface of the object, the radiation collection assembly comprising, a polarization control assembly comprising at least one of a linear polarizer and an apochromatic retarder, an aperture control mechanism, and at least one radiation sensing device.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.