Method of fabricating polymer modulators with etch stop clads
US7713428B2 · kind B2 · utility
1Cited by
7References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 24, 2007 |
| Grant date | May 11, 2010 |
| Priority date | — |
| Expiry date | Oct 26, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2202/022
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A process that comprises dry etching a trench into a side clad polymer layer using an underlying passive polymer layer as an etch stop, and then back filling the trench with an electro-optic polymer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.