Surface treatment method, manufacturing method of color filter substrate, and manufacturing method of electro-optical device
US7713593B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 19, 2006 |
| Grant date | May 11, 2010 |
| Priority date | — |
| Expiry date | Dec 23, 2028 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29L2011/0066
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
A surface treatment method using a plasma treatment apparatus which has an electric discharge generation portion facing a surface of a substrate with a gap therebetween, the substrate being placed on a supporting body, and a construction in which the gap is supplied with a treatment gas, the method includes: applying different voltages between the electric discharge generation portion and the supporting body such that plasma is obtained from the treatment gas supplied to the gap; moving one of the electric discharge generation portion and the substrate relative to the other in a first direction, while the surface of the substrate being exposed to the plasma; and moving, after the relative movement in the first direction and the exposure above referenced, one of the electric discharge generation portion and the substrate relative to the other in a second direction opposite to the first direction, while the surface of the substrate being exposed to the plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.