Patent · US Active

Test method for determining microstructure deformation resistance of a microstructured film

US7716999B2 · kind B2 · utility

0Cited by
5References
19Claims
0Family size

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Key dates

Filing dateOct 3, 2008
Grant dateMay 18, 2010
Priority date—
Expiry dateNov 27, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N2203/0641
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Test method for determining (e.g. prism) microstructure deformation of a microstructured (e.g. brightness enhancing) film are described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.