Apparatus for double-sided imprint lithography
US7717696B2 · kind B2 · utility
3Cited by
13References
14Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2004 |
| Grant date | May 18, 2010 |
| Priority date | — |
| Expiry date | Sep 30, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S425/81
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Apparatus for double-sided imprint lithography of an apertured substrate comprises a pair of correspondingly apertured molds, a support for an assembly of the substrate and molds, and an alignment mechanism with radially movable elements for aligning the apertures of the molds and the substrate. The movable elements can be at least partially disposed in a spindle and can be removed radially outward by a conically tapered drive rod. Opposing surfaces of the substrate can then be imprinted in registration at the same time, preferably by fluid pressure imprint lithography.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.