Fabricating a structure usable in an imprint lithographic process
US7718077B1 · kind B1 · utility
2Cited by
4References
12Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 25, 2006 |
| Grant date | May 18, 2010 |
| Priority date | — |
| Expiry date | Sep 15, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB82Y40/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method of fabricating an article usable in an imprint lithographic process is disclosed. The method includes patterning masking material layers on a substrate thereby forming a multi-layer mask and sequentially removing portions of the substrate based on the multi-layer mask to thereby forming a structure usable in an imprint lithographic process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.