Advanced droplet and plasma targeting system
US7718985B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 26, 2006 |
| Grant date | May 18, 2010 |
| Priority date | — |
| Expiry date | Feb 15, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0027
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Methods, systems, apparatus, devices for tracking, controlling and providing feedback on droplets used in EUV source technology. The method and system track and correct positions of droplet targets and generated plasma including generating the droplet target or plasma, optically imaging the generated target, determining position coordinates, comparing the position coordinates to a set optimal position to determine if a deviation has occurred and moving the generated target back to the optimal position if the deviation has occurred. The optical imaging step includes activating a light source to image the generated target, the light source is strobed at approximately the same rate as the droplet production to provide illumination of the droplet for stroboscopic imaging. The step of moving is accomplished mechanically by moving the generated target back to the predefined position or electronically under computer control.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.