Patent · US Active

Perfluoroalkyleneoxy group-substituted phenylethylsilane compound and polymer thereof

US7719002B2 · kind B2 · utility

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10Claims
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Assignee

Inventors

Key dates

Filing dateAug 31, 2007
Grant dateMay 18, 2010
Priority date
Expiry dateNov 5, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10K71/221
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

Disclosed herein are a perfluoroalkyleneoxy group-substituted phenylethylsilane compound and a polymer thereof. The perfluoroalkyleneoxy group-substituted phenylethylsilane compound represented by Formula 1 has excellent thermal and chemical stability to be solution-processed in a monomer state, and the polymer prepared by thermally crosslinking the compound has a high resistance to organic solvents. Moreover, since an insulating layer prepared by applying the same shows improved thermal and physical properties, it is possible to manufacture organic thin-film transistors having a high on/off ratio in a simple process such as a photolithography for a large-size substrate:wherein R1, R2, R3, Z1, Z2, Z3, and n are the same as defined in the detailed description of the invention.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.