Power supply circuit for plasma generation, plasma generating apparatus, plasma processing apparatus and plasma processed object
US7719198B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Feb 17, 2005 |
| Grant date | May 18, 2010 |
| Priority date | — |
| Expiry date | Jun 17, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/48
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A power supply circuit for plasma generation by which a large quantity of generated plasma can be smoothly obtained without increasing the sizes of an apparatus. An electric discharge generating electrode is composed of two or more first electrodes and one or more second electrodes. An LC series circuit is provided by connecting a capacitor C and a coil L in series between one of outputs of an alternating high voltage generating circuit which generates an alternating high voltage to be applied between the electrodes of electric discharge generating electrode, and the first electrode. When electricity is discharged in one of the electrode pair, voltage drop is suppressed by the coil, and since electric discharge from the other electrode pair is induced without being disturbed, a large quantity of plasma can be smoothly generated by common use of the alternating high voltage generating circuit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.