Patent · US Active

System and method for improving the precision of nanoscale force and displacement measurements

US7721587B2 · kind B2 · utility

5Cited by
5References
18Claims
0Family size

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Key dates

Filing dateMar 12, 2008
Grant dateMay 25, 2010
Priority date
Expiry dateMar 12, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01Q40/00
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

An apparatus and method for improving the precision of nanoscale force and/or displacement measurements using electro micro metrology (EMM).

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.