Anti-reflection film producing method and apparatus
US7722921B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2007 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Feb 3, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B1/111
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Anti-reflection film includes a transparent support, at least one optical functional layer overlaid on the support, and a low refractive index layer, overlaid on the optical functional layer, and having a lower refractive index than the optical functional layer. An anti-reflection film producing apparatus to produce this includes a coater for coating a surface of the optical functional layer with liquid for forming the low refractive index layer, to form a coating layer. A dryer promotes drying of the coating layer. A heater hardens the coating layer from the dryer at a first temperature level, and then hardens the coating layer at a second temperature level higher than the first temperature level, to form the low refractive index layer. Preferably, a difference between the first and second temperature levels is 1-50 deg. C. Also, ultraviolet rays are applied to the low refractive index layer after the hardening of the heater.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.