Encapsulation in a hermetic cavity of a microelectronic composite, particularly of a MEMS
US7723141B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 12, 2007 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Apr 10, 2027 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C2203/0145
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
To produce a structure of a micro-electro-mechanical system (MEMS) in a hermetic cavity (38) of a microelectronic device (50), a prepared cover (30) and substrate (10) are bonded by means of silicon direct bonding (SDB). To optimise the preparation of surfaces by means of wet cleaning without impairing the properties of the MEMS (22), i.e. without causing adhesions, the MEMS structure (22) is not released during bonding, but attached to the base (12) by means of a sacrificial intermediate layer (16). Said layer is removed once bonding has been carried out by injecting HF vapour via a vent (40) opening into the cavity (38).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.