Three dimensional integrated circuit and method of design
US7723207B2 · kind B2 · utility
269Cited by
13References
13Claims
0Family size
Assignee
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Key dates
| Filing date | Apr 19, 2007 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | May 16, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D86/201
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A three dimensional (3D) integrated circuit (IC), 3D IC chip and method of fabricating a 3D IC chip. The chip includes multiple layers of circuits, e.g., silicon insulator (SOI) CMOS IC layers, each including circuit elements. The layers may be formed in parallel and one layer attached to another to form a laminated 3D chip.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.