Patent · US Active

Three dimensional integrated circuit and method of design

US7723207B2 · kind B2 · utility

269Cited by
13References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 19, 2007
Grant dateMay 25, 2010
Priority date
Expiry dateMay 16, 2028

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10D86/201
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

A three dimensional (3D) integrated circuit (IC), 3D IC chip and method of fabricating a 3D IC chip. The chip includes multiple layers of circuits, e.g., silicon insulator (SOI) CMOS IC layers, each including circuit elements. The layers may be formed in parallel and one layer attached to another to form a laminated 3D chip.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.