Method for manufacturing semiconductor device and method for designing photomask pattern
US7723230B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 17, 2008 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Sep 17, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/39
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for designing a photomask pattern is provided. First, all line ends of object patterns are determined with reference to layout data. Then, object patterns, front edge portions, and joints, which are aligned on the same line extending along the Y-axis, are connected to form first reticle data. Reticle pattern data having data representing binding portions serving as light blocking portions is formed. The front edge portions being adjacent to each other and aligned in the X-axis are connected and adjacent joints being aligned in the same manner as the front edge portions are also connected to form second reticle data. Then, portions are provided at central regions between the binding portions so as to connect the adjacent binding portions including the front edge portions and the joints. Then, reticle data having data representing the binding portions serving as transparent patterns is formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.