Patent · US Active

Stripper for electronics

US7723280B2 · kind B2 · utility

14Cited by

27References

10Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Robert L. Brainard · Albany, US
Robert L. Auger · Midland, US
Joseph F. Lachowski · Sutton, US

Key dates

Filing date	Jul 28, 2006
Grant date	May 25, 2010
Priority date	—
Expiry date	Jan 8, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/426
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Compositions and methods useful for the removal of polymeric material from substrates, such as electronic devices are provided. These compositions and methods are particularly suitable for removing polymer residues from electronic devices following plasma etch processes.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.