Patent · US Active

Process for manufacturing high purity methacrylic acid

US7723541B2 · kind B2 · utility

4Cited by
9References
3Claims
0Family size

Assignee

Inventors

Key dates

Filing dateSep 15, 2006
Grant dateMay 25, 2010
Priority date
Expiry dateJan 11, 2028

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07C51/50
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

A process is provided herein for the high yield production of high purity glacial methacrylic acid (“HPMAA”) that is substantially pure, specifically 99% pure or greater, with water content of 0.05% or less and low levels of other impurities, including HIBA, acrylic acid, MOMPA, methacrolein and others. This improved process comprises providing a crude MAA stream and purifying the crude methacrylic acid stream in a series of successive distillation steps involving two distillation columns. The inventive process is capable producing high purity methacrylic acid product that is especially suitable for the production of specialty MAA polymers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.