Plasma processing apparatus
US7723637B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Nov 3, 2006 |
| Grant date | May 25, 2010 |
| Priority date | — |
| Expiry date | Jun 13, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32229
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The purpose of the present invention is to provide homogeneous plasma in longitudinal direction of a plasma processing apparatus applicable to multiple processes. A microwave waveguide 10 with a plurality of variable couplers 12 is placed in a vacuum chamber 21. The microwave generated in a microwave generator 23 is introduced into the microwave waveguide 10 via a waveguide 24. And a plasma 22 in the chamber 21 is generated by the microwave 25. Intensity distribution of the microwave 25 in the microwave waveguide 10 can be varied by moving a plurality of variable couplers 12 individually upward or downward as shown by two-way arrow.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.