Device and method for the evaporative deposition of a coating material
US7727335B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Oct 15, 2003 |
| Grant date | Jun 1, 2010 |
| Priority date | — |
| Expiry date | Jul 5, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/246
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
According to a first aspect, the present invention relates to a device for depositing a high temperature superconductor onto a substrate in vacuum comprising a refilling device for containing a stock of high temperature superconductor material, an evaporation device, that evaporates the high temperature superconductor material within an evaporation zone by means of an energy transferring medium, and a conveyor that transports the high temperature superconductor material continuously from the refilling device to the evaporation zone in such a way that the high temperature superconductor material delivered into the evaporation zone is evaporated essentially without residues. According to a further aspect, the present invention relates to a method to evaporate a high temperature superconductor coating onto a substrate in vacuum, comprising the steps of continuous delivery of granular high temperature superconductor material into an evaporation zone and the operation of a beam of an energy transferring medium, so that the delivered granulate is evaporated in the evaporation zone essentially without residues.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.