Patent · US Active

Plasma reactor

US7727489B2 · kind B2 · utility

1Cited by
5References
12Claims
0Family size

Assignees

Inventors

Key dates

Filing dateMar 14, 2006
Grant dateJun 1, 2010
Priority date
Expiry dateApr 1, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01J37/32009
  • WIPO fieldElectrical machinery, apparatus, energy
  • WIPO sectorElectrical engineering

Abstract

A plasma reactor is provided with two or more plasma generating electrodes which are installed in series inside a gas passage in a casing, with each plasma generating electrode being electrically controlled independently. The surface area of the conductor on each unit electrode forming the plasma generating electrode installed on the upstream side of the gas passage is smaller than the surface area of the conductor on the unit electrode forming the plasma generating electrode installed on the downstream side of the gas passage. Plasma can be generated between each of the unit electrodes by supplying each of the plasma generating electrodes with independently controlled electric power. The plasma reactor can efficiently react specific components contained in the gas passing through the gas passage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.