Method of producing planar multimode optical waveguide using direct photopatterning
US7729587B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 28, 2005 |
| Grant date | Jun 1, 2010 |
| Priority date | — |
| Expiry date | Nov 3, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B6/138
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Disclosed is a method of producing a planar multimode optical waveguide by direct photo-patterning and, more particularly, to an optical waveguide material and a method of producing the same. It is possible to control the refractive index of the optical waveguide, and the optical waveguide has a desirable refractive index distribution throughout different dielectric regions. In the method, it is unnecessary to conduct processes of forming a clad layer and of etching a core layer, thus a production process is simplified. The method comprises coating a photosensitive hybrid material having a refractive index or a volume changed by light radiation, in a thickness of 10 microns or more, and radiating light having a predetermined wavelength onto the coated photosensitive hybrid material to form the multimode optical waveguide due to a change in refractive index of a portion onto which light is radiated.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.