Ion beam method for removing an organic light emitting material
US7731860B2 · kind B2 · utility
1Cited by
14References
20Claims
0Family size
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Key dates
| Filing date | Apr 2, 2004 |
| Grant date | Jun 8, 2010 |
| Priority date | — |
| Expiry date | May 13, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K71/231
Abstract
A method of removing an organic, preferably polymeric, light-emitting material (4) from defined areas of a substrate (1) comprises the steps of arranging a shadow mask (5) to overlie the organic material other than in the defined areas, and applying a beam of ions (7) to the defined areas through the mask. The method is useful in forming organic light-emitting diode arrays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.