System for soft lithography
US7735419B2 · kind B2 · utility
2Cited by
5References
10Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 16, 2006 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Jul 20, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7088
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A transfer sheet placed between a vacuum chuck and a stamp in a soft lithography aligner facilitates three dimensional manufacturing with elastomeric materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.