Micropattern retardation element
US7736708B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Mar 29, 2005 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Feb 8, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B30/25
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention relates to a micropattern retardation element requiring no stretch processing and no extremely high positioning accuracy in cutting films, and the like, and having the retardation region controlled in width of a micron unit, and a producing method therefore. Said micropattern retardation element can be obtained by forming a liquid crystalline or non liquid crystalline polymer thin film layer having photoactive groups, on a substrate, and then, after orientation treatment in a micropattern form, forming a birefringence layer so as to contact with said polymer thin film layer, so that birefringence molecules of said birefringence layer are oriented according to orientation of photoactive groups in said thin film. Said retardation element is used in a three-dimensional display, and the like.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.