Method and system for providing optical proximity correction for structures such as a PMR nose
US7736823B1 · kind B1 · utility
152Cited by
13References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 11, 2007 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Jul 22, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A mask for transferring a pattern for portion of a magnetic recording transducer is disclosed. The masks includes one corner corresponding to an angle of more than ninety degrees and less than one hundred eighty degrees. The mask also includes at least one rectangular serif residing at the corner.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.