Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern
US7736842B2 · kind B2 · utility
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2References
1Claims
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Key dates
| Filing date | Sep 1, 2005 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Nov 12, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure,
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.