Substrate, in particular glass substrate, supporting at least one stack of a photocatalytic layer and a sublayer for the heteroepitaxial growth of said layer
US7737080B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 22, 2004 |
| Grant date | Jun 15, 2010 |
| Priority date | — |
| Expiry date | Jul 12, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C2217/71
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The invention relates to a structure, comprising a substrate supporting a layer with a photocatalytic and anti-soiling property on at least part of the surface thereof, said layer being based on titanium dioxide (TiO2) which is at least partially crystallized in the anatase form thereof. Said structure is characterised in comprising a sublayer (SC) directly under at least one TiO2 layer, said sublayer having a crystallographic structure which provides assistance to crystallization by heteroepitaxial growth in the anatase form of the TiO2-based upper layer, the photocatalytic property being obtained without any heating step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.