Patent · US Expired

Photoelectric conversion device and manufacturing method thereof

US7737519B2 · kind B2 · utility

5Cited by
19References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 27, 2005
Grant dateJun 15, 2010
Priority date
Expiry dateMay 25, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E10/547
  • WIPO fieldAudio-visual technology
  • WIPO sectorElectrical engineering

Abstract

The present invention, in a photoelectric conversion device in which a pixel including a photoelectric conversion device for converting a light into a signal charge and a peripheral circuit including a circuit for processing the signal charge outside a pixel region in which the pixel are disposed on the same substrate, comprising: a first semiconductor region of a first conductivity type for forming the photoelectric region, the first semiconductor region being formed in a second semiconductor region of a second conductivity type; and a third semiconductor region of the first conductivity type and a fourth semiconductor region of the second conductivity type for forming the peripheral circuit, the third and fourth semiconductor regions being formed in the second semiconductor region; wherein in that the impurity concentration of the first semiconductor region is higher than the impurity concentration of the third semiconductor region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.