Chemicallly amplified resist composition
US7741007B2 · kind B2 · utility
3Cited by
10References
22Claims
0Family size
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Key dates
| Filing date | Dec 3, 2007 |
| Grant date | Jun 22, 2010 |
| Priority date | — |
| Expiry date | Dec 3, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a chemically amplified resist composition comprising: wherein R21, Q1, Q2, and A+ defined in the specification; wherein R22, Q3, Q4, and A′+ are defined in the specification; and
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.