Patterning and alteration of molecules

US7741014B2 · kind B2 · utility

Assignee

• President and Fellows of Harvard College · US

Inventors

• Declan Ryan · West Chester, US
• Babak Amir-Parviz · Seattle, US
• Vincent Linder · Tewksbury, US
• Vincent Semetey · Le Mans, FR
• Samuel K. Sia · New York, US
• George M. Whitesides · Newton, US

Key dates

• Filing date: Apr 10, 2006
• Grant date: Jun 22, 2010
• Expiry date: Nov 26, 2027

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C03C2218/32
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

A series of methods, compositions, and articles for patterning a surface with multiple, aligned layers of molecules, by exposing the molecules to electromagnetic radiation is provided. In certain embodiments, a single photomask acts as an area-selective filter for light at multiple wavelengths. A single set of exposures of multiple wavelengths through this photomask may make it possible to fabricate a pattern comprising discontinuous multiple regions, where the regions differ from each other in at least one chemical and/or physical property, without acts of alignment between the exposures. In certain embodiments, the surface includes molecules attached thereto that can be photocleaved upon exposure to a certain wavelength of radiation, thereby altering the chemical composition on at least a portion of the surface.