Patent · US Active

Process for preparing stable photoresist compositions

US7741429B2 · kind B2 · utility

4Cited by

3References

7Claims

0Family size

Assignee

Du Pont Electronic Polymers L.P. · US

Inventors

William R. Russell · Miamisburg, US
John Anthony Schultz · Kettering, US

Key dates

Filing date	Nov 17, 2006
Grant date	Jun 22, 2010
Priority date	—
Expiry date	Sep 17, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/0392
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A method of making a stable photoresist solution containing a polymer from a solution of a polymer containing trace metals, said method comprising the steps of:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.