Apparatus and method for photomask design
US7743359B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Aug 13, 2005 |
| Grant date | Jun 22, 2010 |
| Priority date | — |
| Expiry date | Sep 6, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/20
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
An apparatus and method of synthesizing a photolithographic data set includes using a first computational model to calculate a first figure-of-merit for the photolithographic data set; changing a first part of the photolithographic data set to increase the first figure-of-merit; and then using a second computational model to calculate a second figure-of-merit of the photolithographic data set; and changing a second part of the photolithographic data set to increase the second figure-of-merit. The second computational model enables figure-of-merit calculations to be executed at a significantly faster execution rate than the first computational model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.