Process for enhancing the resolution of a thermally transferred pattern

US7744717B2 · kind B2 · utility

Assignee

• E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

• Gerald Donald Andrews · Hockessin, US
• Richard Kevin Bailey · Newark, US
• Graciela Beatriz Blanchet · Boston, US
• John Catron · Smyrna, US
• Feng Gao · Beijing, CN
• Gary Delmar Jaycox · West Chester, US
• Lynda Kaye Johnson · Wilmington, US
• Roupen Leon Keusseyan · Raleigh, US
• Jeffrey Scott Meth · Landenberg, US
• Frank S. Principe · Landenberg, US
• Rinaldo S. Schiffino · Wilmington, US
• Robert Mar Yohannan · Rutledge, US

Key dates

• Filing date: Apr 25, 2007
• Grant date: Jun 29, 2010
• Expiry date: Oct 3, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10K85/655
• WIPO field: Audio-visual technology
• WIPO sector: Electrical engineering

Abstract

Provided are processes for enhancing the resolution of a thermally transferred pattern on an imaged thermal transfer receiver, wherein the imaged thermal transfer receiver comprises a surface having an exposed portion and a non-exposed portion of one or more thermally transferred layer(s), comprising: (a) contacting said surface with an adhesive layer for a contact period to provide a laminate; (b) separating said adhesive layer from the laminate to provide a treated thermal transfer receiver having a surface substantially free of said non-exposed portion of one or more thermally transferred layer(s). The processes are useful in the fabrication of electronic devices including thin film transistors, circuits, electromagnetic interference shields, touchpad sensors and other electronic devices.