Composition for coating over a photoresist pattern
US7745077B2 · kind B2 · utility
18Cited by
46References
19Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 18, 2008 |
| Grant date | Jun 29, 2010 |
| Priority date | — |
| Expiry date | Jun 18, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/40
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to an aqueous coating composition for coating a photoresist pattern, comprising a polymer comprising at least one unit with an alkylamino group, where the unit has a structure (1),where, R1 to R5 are independently selected from hydrogen and C1 to C6 alkyl, and W is C1 to C6 alkyl. The invention also relates to a process for imaging a photoresist layer using the present composition.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.