Method of removing an oxide and method of filling a trench using the same
US7745305B2 · kind B2 · utility
1Cited by
2References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 14, 2008 |
| Grant date | Jun 29, 2010 |
| Priority date | — |
| Expiry date | Jul 5, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02164
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of removing a portion of an oxide layer includes forming first byproducts by reacting a reaction gas with the oxide layer, the reaction gas including fluorine and nitrogen, reacting the reaction gas with the first byproducts to form second byproducts, and removing the second byproducts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.