Optical trapping with a semiconductor
US7745788B2 · kind B2 · utility
7Cited by
66References
51Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 22, 2006 |
| Grant date | Jun 29, 2010 |
| Priority date | — |
| Expiry date | Apr 4, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/32
- WIPO fieldEngines, pumps, turbines
- WIPO sectorMechanical engineering
Abstract
A method and apparatus are disclosed for forming an optical trap with light directed through or above a semiconductor material. A preferred embodiment selected light-trapping wavelengths that have lower absorption by the semiconductor. A preferred embodiment provides for an optical trapping through semiconductor employing a thin silicon (Si) wafer as a substrate. Further embodiments of the invention provide for microchannel fabrication, force probe measurement, sorting, switching and other active manipulation and assembly using an optical trap.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.