X-ray reflectometry system with multiple sample holder and individual sample lifting mechanism
US7746980B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 16, 2008 |
| Grant date | Jun 29, 2010 |
| Priority date | — |
| Expiry date | Jan 30, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/20025
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An X-ray reflectometry apparatus comprises an X-ray source (1) configured to emit an incident X-ray beam directed onto a sample measuring position and an X-ray detector (2) configured to detect an X-ray beam (3) reflected from a surface of a selected sample (4) located in said sample measuring position and with a multiple sample holder (5) comprising an essentially horizontal one- or two-dimensional array of sample resting positions into which solid samples can be placed from above. A drive mechanism (6) moves the sample holder in one or two directions within a horizontal plane underneath the sample measuring position in order to place a selected sample (4) directly beneath the measuring position and a sample lift mechanism (7) has a vertically movable piston (8) located below the multiple sample holder (5) beneath the sample measuring position. When the sample lift mechanism (7) is activated, the piston (8) moves upwards against a bottom surface of the selected sample (4) or sample container (9) containing said selected sample (4), lifts the selected sample (4) or sample container (9) until it touches a stop (10) that keeps the sample (4) in the sample measuring position. When the…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.