Interspinous process implant having deployable wing and method of implantation

US7749252B2 · kind B2 · utility

Assignee

• KYPHON SARL · CH

Inventors

• James F. Zucherman · San Francisco, US
• Ken Y. Hsu · San Francisco, US
• Charles J. Winslow · Walnut Creek, US
• John J. Flynn · Concord, US
• Steve Mitchell · Pleasant Hill, US
• Scott A. Yerby · Montara, US
• John A. Markwart · Castro Valley, US

Key dates

• Filing date: Mar 17, 2006
• Grant date: Jul 6, 2010
• Expiry date: Nov 21, 2028

Classification

• Technology area (CPC A): Human Necessities
• CPC primary: A61B17/7065
• WIPO field: Medical technology
• WIPO sector: Instruments

Abstract

Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.