Positive type dry film photoresist and composition for preparing the same
US7749676B2 · kind B2 · utility
0Cited by
9References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2005 |
| Grant date | Jul 6, 2010 |
| Priority date | — |
| Expiry date | Dec 7, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0233
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positive type photoresist resin film contains a support film and a positive photoresist resin layer laminated over the support film. The peak height (Rp) of the support film is less than about 300 nm to eliminate fish eye defects. The positive photoresist resin layer may contain alkali soluble resin, a diazide based photosensitive compound, a plasticizer and, optionally, a sensitivity enhancer and a releasing agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.