Holder made from quartz glass for the processing of semiconductor wafers and method for production of the holder

US7749930B2 · kind B2 · utility

Assignee

• HERAEUS QUARZGLAS GMBH & CO. KG · DE

Inventors

• Juergen Weber · Erlangen, DE
• Tobias Pogge · Zwingenberg, DE
• Martin Trommer · Bitterfeld-Wolfen, DE
• Bodo Kuehn · Gelnhausen, DE
• Ulrich Kirst · Mainz, DE
• Waltraud Werdecker · Hanau, DE

Key dates

• Filing date: Mar 30, 2006
• Grant date: Jul 6, 2010
• Expiry date: Aug 20, 2027

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y02P40/57
• WIPO field: Materials, metallurgy
• WIPO sector: Chemistry

Abstract

An ideal quartz glass for a wafer jig for use in an environment having an etching effect is distinguished by both high purity and high resistance to dry etching. To indicate a quartz glass that substantially fulfills these requirements, it is suggested according to the invention that the quartz glass is doped with nitrogen at least in a near-surface area, has a mean content of metastable hydroxyl groups of less than 30 wt ppm and that its fictive temperature is below 1250° C. and its viscosity is at least 1013 dPa·s at a temperature of 1200° C. An economic method for producing such a quartz glass comprises the following method steps: melting an SiO2 raw material to obtain a quartz glass blank, the SiO2 raw material or the quartz glass blank being subjected to a dehydration measure, heating the SiO2 raw material or the quartz glass blank to a nitriding temperature in the range between 1050° C. and 1850° C. in an ammonia-containing atmosphere, a temperature treatment by means of which the quartz glass of the quartz glass blank is set to a fictive temperature of 1250° C. or less, and a surface treatment of the quartz glass blank with formation of the quartz glass jig.