Patent · US Active

Device for the generation of a gas curtain for plasma-based EUV radiation sources

US7750327B2 · kind B2 · utility

5Cited by

2References

30Claims

0Family size

Assignee

XTREME technologies GmbH · DE

Inventors

Chinh Duc Tran · Oettingen, DE
Jesko Brudermann · Oettingen, DE
Bjoern Mader · Hannover, DE
Gilbert Dornieden · Duderstadt, DE
Thomas Brauner · Berlin, DE

Key dates

Filing date	May 14, 2008
Grant date	Jul 6, 2010
Priority date	—
Expiry date	Oct 18, 2028

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70908
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The invention is directed to a device for generating flows of gas for filtering the radiation emitted in plasma-based radiation sources. It is the object of the invention to find a novel possibility for generating a gas curtain in the immediate vicinity of a radiating plasma so as to permit a simple arrangement and design and a long life of the device for generating the gas curtain under extreme thermal stress. According to the invention, this object is met in that a slit nozzle is formed of a plurality of partial bodies comprising different materials to form a supersonic nozzle profile for the generation of a broad gas curtain in order to accommodate the slit nozzle to different thermal and precision-mechanical requirements in the gas inlet region and in the gas outlet region.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.