Apparatus and method for nanoscale pattern generation
US7752997B1 · kind B1 · utility
3Cited by
7References
8Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Feb 14, 2006 |
| Grant date | Jul 13, 2010 |
| Priority date | — |
| Expiry date | Nov 12, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S977/893
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method and apparatus that produces highly ordered, nanosized particle arrays on various substrates. These regular arrays may be used as masks to deposit and grow other nanoscale materials.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.